What Does VALE Stand For?

VALE stands for Vacuum Atomic Layer Epitaxy

VALE, or Vacuum Atomic Layer Epitaxy, is a sophisticated thin-film deposition technique utilized in materials science and semiconductor manufacturing. This method enables the precise growth of crystalline layers through the sequential introduction of gaseous precursors in a vacuum environment, allowing for atomic-level control over film thickness and composition. VALE is particularly valued for its ability to produce high-quality, uniform films with controlled properties, making it ideal for applications in electronics, optoelectronics, and nanotechnology.