What Does ALD Stand For?

ALD stands for Atomic Layer Deposition

Atomic Layer Deposition (ALD) is a thin-film deposition technique used to create precise, conformal coatings at the atomic level. This process involves alternating exposure of a substrate to two or more reactive precursors, which react sequentially to form a monolayer of material. ALD is widely utilized in semiconductor manufacturing, nanotechnology, and materials science for its ability to produce uniform films with excellent control over thickness and composition.

Other Meanings for ALD