What Does CVD Stand For?
CVD stands for Chemical Vapor Deposition
CVD, or Chemical Vapor Deposition, is a versatile chemical process used to produce thin films, coatings, and materials on various substrates. It involves the chemical reaction of vapor-phase precursors, which decompose or react on a substrate surface at elevated temperatures to form solid deposits. CVD is widely utilized in semiconductor manufacturing, photovoltaic cells, and the production of advanced materials, enabling precise control over material properties and conformal coating of complex geometries.
Added on 14th April 2008 | Last edited on 17th June 2025 | Edit Acronym