What Does EBL Stand For?

EBL stands for Electron Beam Lithography

Electron Beam Lithography (EBL) is a high-resolution patterning technique used primarily in semiconductor manufacturing and nanotechnology. It employs a focused beam of electrons to write custom patterns onto a substrate coated with an electron-sensitive film, known as a resist. This method allows for the fabrication of intricate micro and nanoscale structures with exceptional precision, making it essential for developing advanced electronic, optical, and biomedical devices. EBL is recognized for its ability to achieve resolutions down to the nanometer scale, although it is typically slower and more expensive than traditional photolithography techniques.

Other Meanings for EBL