What Does EICP Stand For?

EICP stands for Enclosed Inductively Coupled Plasma

EICP, or Enclosed Inductively Coupled Plasma, is a specialized plasma technology that operates by utilizing radiofrequency energy to generate and sustain plasma within an enclosed chamber. This method enhances process efficiency and control, making it ideal for various applications such as material processing, surface treatment, and thin film deposition. EICP systems are designed to minimize contamination while maximizing uniformity and scalability, contributing to advancements in semiconductor manufacturing and other high-precision industries.