What Does EUVL Stand For?

EUVL stands for Extreme Ultraviolet Lithography

EUVL, or Extreme Ultraviolet Lithography, is an advanced photolithography technique used in semiconductor manufacturing. It utilizes extreme ultraviolet light with wavelengths around 13.5 nanometers to create extremely fine patterns on silicon wafers. This technology enables the production of smaller and more efficient microchips, facilitating the continued miniaturization of electronic components and enhancing the performance of integrated circuits. EUVL is essential for achieving higher resolution and precision in the fabrication of next-generation semiconductor devices.