What Does GILD Stand For?

GILD stands for Gas Immersion Laser Doping

GILD, or Gas Immersion Laser Doping, is a precise technique utilized in semiconductor fabrication. It involves the use of laser energy to implant dopant gases into a substrate, allowing for enhanced control over doping profiles and concentrations. This method improves the electrical properties of materials, facilitating the development of advanced electronic devices and enhancing performance in applications such as photovoltaics, transistors, and integrated circuits. GILD is noted for its efficiency, accuracy, and ability to minimize damage to the substrate compared to traditional doping methods.