What Does ICPD Stand For?

ICPD stands for Inductively Coupled Plasma Deposition

ICPD, or Inductively Coupled Plasma Deposition, is a thin-film deposition technique that utilizes plasma generated by inductively coupled electromagnetic fields to deposit materials onto a substrate. This method allows for precise control over film composition, thickness, and microstructure, making it suitable for various applications in semiconductors, optics, and coatings. ICPD is known for its ability to produce high-quality films at low temperatures, enabling the deposition of materials that are sensitive to heat.