What Does NPCVD Stand For?

NPCVD stands for Normal Pressure Chemical Vapor Deposition

Normal Pressure Chemical Vapor Deposition (NPCVD) is a deposition technique used to produce thin films and coatings by chemically transforming gaseous precursors into solid materials at atmospheric pressure. This method allows for the uniform deposition of high-quality materials on substrates, making it suitable for applications in electronics, optics, and materials science. NPCVD offers advantages such as scalability and cost-effectiveness, enabling efficient production processes in various industrial settings.