What Does PACE Stand For?

PACE stands for Plasma Assisted Chemical Etching

PACE, or Plasma Assisted Chemical Etching, is a sophisticated technique used in semiconductor manufacturing and microfabrication processes. It combines the precision of chemical etching with the enhanced control provided by plasma interactions. This method enables the selective removal of materials at the nanoscale, effectively improving etching profiles, reducing feature dimensions, and achieving high aspect ratios while minimizing surface damage and profile distortion. PACE is integral to the fabrication of advanced electronic devices, including integrated circuits and MEMS.

Other Meanings for PACE