What Does PACVD Stand For?

PACVD stands for Plasma Assisted Chemical Vapor Deposition

PACVD, or Plasma Assisted Chemical Vapor Deposition, is a technology used for the deposition of thin films onto various substrates. It involves the use of plasma to enhance the chemical reactions of gaseous precursors, resulting in improved film uniformity, adhesion, and quality. PACVD is widely utilized in industries such as semiconductor manufacturing, optics, and coatings, where precise control over material properties and thickness is essential. The process allows for the deposition of a variety of materials, including metals, insulators, and polymers, making it a versatile technique in advanced materials fabrication.