What Does PBII Stand For?

PBII stands for Plasma Based Ion Implantation

PBII, or Plasma Based Ion Implantation, is an advanced surface modification technique that utilizes plasma technology to effectively implant ions into materials. This method enhances the physical and chemical properties of materials, making it valuable for applications in semiconductor fabrication, materials science, and surface engineering. PBII offers advantages such as improved ion uniformity, reduced thermal damage, and the ability to tailor material properties for specific applications.