What Does PIII Stand For?
PIII stands for Plasma Immersion Ion Implantation
PIII, or Plasma Immersion Ion Implantation, is an advanced technique used in materials processing and surface modification. It involves immersing a substrate in a plasma environment, where ions are generated and subsequently accelerated towards the substrate. This process allows for the implantation of various ions into the surface of materials, enhancing properties such as hardness, wear resistance, and corrosion resistance. PIII is widely utilized in semiconductor manufacturing, aerospace, and biomedical applications due to its ability to improve material performance without significant thermal damage.
Added on 14th April 2008 | Last edited on 16th June 2025 | Edit Acronym