What Does PSII Stand For?

PSII stands for Plasma Source Ion Implantation

Plasma Source Ion Implantation (PSII) is a surface modification technique used in materials science and semiconductor fabrication. It involves the generation of a plasma to produce ionized species, which are then implanted into a substrate to enhance its properties. PSII allows for precise control over ion energy and dosing, enabling the modification of surface characteristics such as conductivity, hardness, and chemical reactivity. This method is particularly valuable in improving the performance and durability of materials in various applications, including electronics, optics, and nanotechnology.

Other Meanings for PSII