What Does SIDP Stand For?

SIDP stands for Sputter Ion Depth Profiling

SIDP, or Sputter Ion Depth Profiling, is an analytical technique used to investigate the composition and structure of materials at varying depths. By sputtering away layers of a sample's surface with ion beams, SIDP enables researchers to obtain detailed elemental or isotopic distribution profiles. This method is particularly valuable in fields such as materials science, semiconductor manufacturing, and surface analysis, as it provides insights into the layering, thickness, and interface characteristics of multi-layered structures.