What Does CCP Stand For?

CCP stands for Capacitively Coupled Plasma

Capacitively Coupled Plasma (CCP) is a technology used in various applications, including materials processing and thin film deposition. It involves creating a plasma discharge by applying an alternating electric field between two electrodes, which are capacitively coupled to the plasma. This method allows for precise control over the energy and density of the plasma, making it suitable for processes such as etching and chemical vapor deposition in semiconductor manufacturing. CCP systems are valued for their ability to operate at low pressures and their efficiency in producing uniform plasma characteristics.

Other Meanings for CCP